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Hada Labo

Advanced Nourish Hyaluronic Acid Lotion For Normal To Dry Skin

Get a score how it matches your skin

Product Claims

10/10 Claims Met
✓ Alcohol-free
✓ EU-allergen-free
✓ Oil-free
✓ Paraben-free
✓ Silicone-free
✓ Sulfate-free
✓ Cruelty-free
✓ Reef-safe
✓ Fragrance-free
✓ Fungal-acne-safe
1
Water EWG 1
Solvent
2
Butylene Glycol EWG 1
Fragrance ingredientSkin conditioning agentSolventViscosity controlling agentHumectantMasking
Hair Loss PreventionMoisturizingSoftening Comedogenic 1/5
3
Pentylene Glycol EWG 1
SolventSkin conditioning agent
Hair ConditioningMoisturizing
4
Dipropylene Glycol EWG 1-2
Fragrance ingredientSolventViscosity controlling agentMasking
Moisturizing
5
Hydrolyzed Hyaluronic Acid EWG 1
Anti AgingElasticity ImprovementMoisturizing
6
Sodium Acetylated Hyaluronate EWG 1
Humectant
7
Sodium Hyaluronate EWG 1
Skin conditioning agentHumectant
RejuvenationAnti AgingMoisturizingSoftening
8
Acetone EWG 3
DenaturantFragrance ingredientSolvent
9
Disodium EDTA EWG 1
Chelating agentViscosity controlling agent
10
Disodium Phosphate EWG 1
Buffering agentCorrosion inhibitorFragrance ingredientPH adjusterAnticorrosiveMasking
Tooth Whitening
11
Disodium Succinate EWG 1
Fragrance ingredientMaskingSurfactant
RegenerationAntioxidant
12
Glyoxal EWG 9
Fragrance ingredientPreservativeAntimicrobial agent
13
Hydroxyethylcellulose EWG 1
BinderEmulsion stabilizerFilm formerViscosity controlling agentBindingStabilising
14
PPG-10 Methyl Glucose Ether EWG 1
Hair conditioningSkin conditioning agent
15
Sodium Nitrate EWG 1
Oral care agentSoothing
16
Succinic Acid EWG 1
Fragrance ingredientPH adjusterBuffering agentMasking
RegenerationRejuvenationLiftingAnti AgingCleansingAntisepticElasticity ImprovementSoothing
17
Phenoxyethanol EWG 2-4
Fragrance ingredientPreservative
Antiseptic